VUV-VASE Ellipsometer
The VUV-VASE® variable angle spectroscopic ellipsometer is the gold standard for optical characterization of lithography thin films. It measures wavelengths from vacuum ultraviolet (VUV) to near infrared (NIR). This provides incredible versatility to characterize numerous materials: semiconductors, dielectrics, polymers, metals, multi-layers and liquids such as immersion fluids
Why a VUV-VASE?
Wide Spectral Range
The VUV-VASE covers wavelengths from below 140nm to 1700nm.High Accuracy
Utilizing our patented AutoRetarder®, the VUV-VASE guarantees accuracy for any sample measurement.Convenient Sample Loading
Special design allows fast, efficient sample loading without contaminating system purge.Protect Your Samples
The monochromator is placed before the sample to limit exposure of photosensitive materials.Product Category: Ellipsometry
Industry: Particle and surface science
Supplier: J A Woollam
Description
LITHOGRAPHY APPLICATIONS
Lithography thin films were an important motivation for the VUV-VASE® development. It has been successfully used to characterize all types of films in this area, including:
• Photoresists
• Bottom and Top AR Coatings
• Photomask Coatings
• Hardmasks
• Stepper Optical Coatings
• Pellicles
•CaF2 Optics
• And more…
PHOTORESIST
Measure film thickness and refractive index (n and k) at all lithography lines: 157nm, 193nm, 248nm…
Specifications
| Ellipsometer Configuration | RAE with AutoRetarder | |
| Wavelength Range | VUV-VASE (Standard) VUV-VASE+NIR VUV-VASE+XNIR |
146-1100 nm 146-1700 nm 146-2500 nm |
| Number of Wavelengths | User defined before measurement | |
| Angles of Incidence | 10° to 90° (146nm to 310nm) 25° to 90° (310nm to 2500nm) |
|
| Data Acquisition Rate | 1 to 3 seconds per wavelength | |
Facility Requirements
| Power | 100-120 VAC/15A, 200-240 VAC/8A |
| Gas Requirements | Contact J.A. Woollam for details. |
Dimensions
